Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography
US9587136B2 · kind B2 · utility
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Key dates
| Filing date | Oct 8, 2013 |
| Grant date | Mar 7, 2017 |
| Priority date | — |
| Expiry date | May 5, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/268
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.