Daniel Patrick Sweat
8Patents
1h-index
10Co-inventors
40Inventor score
Filing activity: Mar 13, 2013 → Sep 17, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9097979B2 | Block copolymer-based mask structures for the growth of nanopatterned polymer brushes | Physics | 2 | Active |
| US11078337B2 | High-χ block copolymers for directed self-assembly | Chemistry; Metallurgy | 0 | Active |
| US8999623B2 | Degradable neutral layers for block copolymer lithography applications | Performing Operations; Transporting | 0 | Active |
| US10106699B2 | Inimer-containing random copolymers and crosslinked copolymer films for dense polymer brush growth | Chemistry; Metallurgy | 0 | Active |
| US10913873B2 | Block copolymers with high flory-huggins interaction parameters for block copolymer lithography | Emerging Cross-Sectional Technologies | 0 | Active |
| US10465087B2 | Methods of making crosslinked copolymer films from inimer-containing random copolymers | Chemistry; Metallurgy | 0 | Active |
| US9587136B2 | Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography | Emerging Cross-Sectional Technologies | 0 | Active |
| US10961383B2 | Gradient block copolymers for directed self-assembly | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.