Polymer, organic layer composition, organic layer, and method of forming patterns
US9593205B2 · kind B2 · utility
1Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2015 |
| Grant date | Mar 14, 2017 |
| Priority date | — |
| Expiry date | Nov 9, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/3424
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A polymer, an organic layer composition including the polymer, an organic layer formed from the organic layer composition, and a method of forming patterns using the organic layer composition, the polymer including a moiety represented by Chemical Formula 1:*-A1-A3A2-A4n*. [Chemical Formula 1]
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.