Patent · US Active

Methods of processing substrates

US9595446B2 · kind B2 · utility

0Cited by
12References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 2014
Grant dateMar 14, 2017
Priority date
Expiry dateJan 9, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/15311
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Methods processing substrates are provided. The method may include providing a bonding layer between a substrate and a carrier to bond the substrate to the carrier, processing the substrate while the substrate is supported by the carrier, and removing the bonding layer to separate the substrate from the carrier. The bonding layer may include a thermosetting glue layer and thermosetting release layers provided on opposing sides of the thermosetting glue layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.