Patent · US Active

Measuring probe

US9605943B2 · kind B2 · utility

5Cited by

5References

19Claims

0Family size

Assignee

Mitutoyo Corporation · JP

Inventors

Atsushi Shimaoka · Kashihara, JP
Tomoyuki Miyazaki · Kakegawa, JP
Kazuhiko Hidaka · Yokohama, JP

Key dates

Filing date	Jul 1, 2015
Grant date	Mar 28, 2017
Priority date	—
Expiry date	Aug 11, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG01B5/012
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A measuring probe includes a stylus, an axial motion mechanism, and a rotary motion mechanism. The axial motion mechanism includes a pair of first diaphragm structures that allows a moving member to be displaced, and the rotary motion mechanism includes a second diaphragm structure that allows a rotating member to be displaced. The second diaphragm structure is disposed between the pair of first diaphragm structures in an axial direction. The respective first diaphragm structures are disposed at a symmetric distance with respect to the second diaphragm structure. This can reduce the length in the axial direction and weight thereof and also reduce shape errors and improve measurement accuracy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.