Patent · US Active

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

US9606434B2 · kind B2 · utility

1Cited by

6References

8Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Paul J. LaBeaume · Auburn, US
Vipul Jain · Irvine, US
James W. Thackeray · Braintree, US
James F. Cameron · Brookline, US
Suzanne M. Coley · Mansfield, US
Amy M. Kwok · Shrewsbury, US
David A. Valeri · Leominster, US

Key dates

Filing date	Aug 24, 2015
Grant date	Mar 28, 2017
Priority date	—
Expiry date	Aug 24, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0397
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I)wherein q, r, R1, m, X, and Z− are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.