Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and compound
US9606437B2 · kind B2 · utility
1Cited by
2References
11Claims
0Family size
Assignees
Inventor
Key dates
| Filing date | Mar 2, 2015 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Mar 2, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A fluorine-containing compound represented by a following general formula (1) is provided. [In the general formula (1), X represents a halogen atom or an alkoxy group, R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups. n represents an integer of 0 or greater.]
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.