High density plasma reactor with multiple top coils
US9607809B2 · kind B2 · utility
0Cited by
11References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2014 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Mar 12, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3211
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor includes an enclosure having a top and a bottom and defining a processing chamber. Inlets are formed in the enclosure for injecting process gas into the chamber. An outlet is formed in the enclosure for withdrawing gas from the chamber. A platform is positioned to support a wafer in the chamber above the bottom. A plurality of coils is positioned above the top of the chamber. Each coil is coupled to a radio frequency generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.