Structure and method for reflective-type mask
US9612523B2 · kind B2 · utility
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2References
20Claims
0Family size
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Key dates
| Filing date | May 29, 2015 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Jun 1, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective mask includes a substrate; a reflective multilayer formed on the substrate; an absorber layer formed on the reflective multilayer, wherein the absorber layer is patterned to have openings according to an integrated circuit layout; and a protection layer formed over the reflective multilayer within the openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.