Method of operating a microlithographic apparatus
US9612540B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 23, 2015 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Aug 8, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7055
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of operating a microlithographic apparatus comprises the steps of providing an illumination system comprising an array of tiltable mirrors, wherein a light irradiance distribution on the array varies by at least 50% along a first line; specifying a scan integrated target angular light distribution and a target light energy for a point moving through an illumination field along a second line that extends parallel to a scan direction and is an image of the first line; determining a group of those mirrors through which the first line extends; determining tilt angles of the mirrors of the group such that a real angular light distribution and a real light energy for the point approximate the respective target values; producing the illumination field by forming an image of the array on a mask; and imaging a portion of the mask on a surface while the mask moves along the scan direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.