Process chamber, method of preparing a process chamber, and method of operating a process chamber
US9613819B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2014 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Jun 30, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Process chambers and methods of preparing and operating a process chamber are disclosed. In some embodiments, a method of preparing a process chamber for processing a substrate includes: forming a first barrier layer over an element disposed within a cavity of the process chamber, the element comprising an outgassing material; and forming, within the process chamber, a second barrier layer over the first barrier layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.