Method of manufacturing a semiconductor device using purified block copolymers and semiconductor devices
US9627205B2 · kind B2 · utility
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5References
20Claims
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Key dates
| Filing date | Oct 10, 2014 |
| Grant date | Apr 18, 2017 |
| Priority date | — |
| Expiry date | Jun 27, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76816
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In a method of manufacturing a semiconductor device, a blend solution that includes a block copolymer and an adsorbent is prepared. The block copolymer is synthesized by a copolymerization between a first polymer unit and a second polymer unit having a hydrophilicity greater than that of the first polymer unit. The adsorbent on which the block copolymer is adsorbed is extracted. The block copolymer is separated from the adsorbent. The block copolymer is collected. The block copolymer may be used to form a mask on an object layer on a substrate and the mask used to etch the object layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.