Patent · US Active

Fullerenes

US9632409B2 · kind B2 · utility

0Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 21, 2014
Grant dateApr 25, 2017
Priority date
Expiry dateMay 21, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2604/00
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.