Fullerenes
US9632409B2 · kind B2 · utility
0Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 2014 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | May 21, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2604/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.