Patent · US Active

In-situ immersion hood cleaning

US9632426B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Jui-Chun Peng · Hsinchu, TW
Heng-Jen Lee · Baoshan, TW

Key dates

Filing date	Jan 18, 2011
Grant date	Apr 25, 2017
Priority date	—
Expiry date	Jul 4, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67057
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus includes a wafer stage configured to secure a wafer; and a cleaning module including a tank adjacent to the wafer stage, and is positioned outside the region occupied by the wafer. The cleaning module is configured to receive de-ionized (DI) water into the tank and extract the DI water out of the tank. The tank is configured to hold DI water with a top surface of the DI water substantially level with a top surface of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.