Electron beam microscope with improved imaging gas and method of use
US9633816B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2015 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | May 18, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2806
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.