Optical design for line generation using microlens array
US9636778B2 · kind B2 · utility
1Cited by
8References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2015 |
| Grant date | May 2, 2017 |
| Priority date | — |
| Expiry date | Aug 8, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L24/80
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Embodiments of the present disclosure relate to an apparatus for thermally processing a semiconductor substrate. In one embodiment, the apparatus includes a substrate support, a beam source having a fast axis for emitting a beam along an optical path intersecting the substrate support, and a homogenizer disposed along the optical path between the beam source and the substrate support. The homogenizer comprises a first lens array, and a second lens array, wherein lenses of the second lens array have a larger lenslet array spacing than lenses of the first lens array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.