Method and system for optical measurements
US9645096B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2015 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Sep 22, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure includes a method for optical measurements. The method includes providing a substrate with a structure for optical measurement on the substrate; and illuminating a light spot on the structure for optical measurement to obtain a measured light scattering spectrum. The method also includes performing a first matching process to obtain a plurality of matching standard optical scattering spectra and a plurality of first matching degrees, each standard optical scattering spectrum corresponding to one first matching degree; obtaining a plurality of combined optical scattering spectra based on the plurality of matching standard optical scattering spectra; and performing a second matching process to obtain a plurality second matching degree, each corresponding to one combined optical scattering spectrum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.