Inventor · Shanghai, CN

Boxiu Cai

14Patents

1h-index

4Co-inventors

39Inventor score

Filing activity: Jan 31, 2013 → Oct 25, 2017

Most-cited inventions

Patent	Title	Area	Cited by	Status
US9316925B2	Methods for monitoring source symmetry of photolithography systems	Physics	4	Active
US8742345B1	Method for detecting electron beam of scanning electron microscope and for detecting fine patterns	Electricity	1	Active
US10163806B2	Photolithography alignment mark structures and semiconductor structures	Electricity	1	Active
US9620458B2	Photolithography alignment mark structures, semiconductor structures, and fabrication method thereof	Electricity	1	Active
US9946155B2	Photolithographic mask	Physics	0	Active
US9105079B2	Method and system for obtaining optical proximity correction model calibration data	Electricity	0	Active
US9406515B2	Laser annealing device including tunable mask and method of using the same	Electricity	0	Active
US9679822B1	Method for monitoring epitaxial growth geometry shift	Electricity	0	Active
US9829788B2	Photolithographic mask and fabrication method thereof	Physics	0	Active
US8829424B2	Method and apparatus for monitoring electron beam condition of scanning electron microscope	Electricity	0	Active
US9348215B2	Photolithographic masks and fabrication method thereof	Physics	0	Active
US9019152B2	Standard wafer and its fabrication method	Electricity	0	Active
US9257287B2	Laser annealing device and method	Electricity	0	Active
US9645096B2	Method and system for optical measurements	Physics	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.