Patent · US Active

Collector

US9645503B2 · kind B2 · utility

1Cited by
1References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 2014
Grant dateMay 9, 2017
Priority date
Expiry dateMar 3, 2035

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG21K2201/067
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.