Notch detection and correction in mask design data
US9646129B2 · kind B2 · utility
1Cited by
5References
20Claims
0Family size
Assignee
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Key dates
| Filing date | May 29, 2015 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | May 29, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Mask data is analyzed for the presence of a notch. A notch candidate on a polygon boundary of mask data is defined as a plurality of line segments that includes an initial line segment, a final line segment and at least two line segments therebetween. The initial and final line segments define adjacent edges of the notch candidate. A direction of each line segment is a direction of travel from the initial line segment to the final line segment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.