Tunable magnetic field to improve uniformity
US9646843B2 · kind B2 · utility
3Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2015 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Aug 19, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.