Reactor gas panel common exhaust
US9650727B2 · kind B2 · utility
0Cited by
7References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 16, 2014 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Jul 29, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing system is described that has a reactor and a gas panel, and a common exhaust for the reactor and the gas panel. An exhaust conduit from the reactor is routed to the gas panel, and exhaust gases from the reactor are used to purge the gas panel. Gases from the reactor may be cooled before flowing to the gas panel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.