Patent · US Active

Temperature controlled chamber liner

US9653267B2 · kind B2 · utility

298Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 1, 2012
Grant dateMay 16, 2017
Priority date
Expiry dateMar 22, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24479
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A liner for a semiconductor processing chamber and a semiconductor processing chamber are provided. In one embodiment, a liner for a semiconductor processing chamber includes a body having an outwardly extending flange. A plurality of protrusions extend from a bottom surface of the flange. The protrusions have a bottom surface defining a contact area that is asymmetrically distributed around the bottom surface of the flange.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.