Middle-of-line integration methods and semiconductor devices
US9653399B2 · kind B2 · utility
3Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2015 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Feb 13, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electronic device includes a middle-of-line (MOL) stack. The electronic device includes a top local interconnect layer and a contact coupling the top local interconnect layer to a gate of a semiconductor device through a first dielectric layer. The electronic device also includes one or more isolation walls between the contact and the first dielectric layer, wherein the one or more isolation walls include aluminum nitride (AlN).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.