Arrangement of a mirror

US9658533B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Johannes Ruoff · Aalen, DE
• Heiko Feldmann · Aalen, DE
• Michael Layh · Altusried, DE

Key dates

• Filing date: May 5, 2014
• Grant date: May 23, 2017
• Expiry date: Jul 9, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mirror for EUV radiation comprises a total reflection surface, which has a first EUV-radiation-reflecting region and at least one second EUV-radiation-reflecting region, wherein the EUV-radiation-reflecting regions are structurally delimited from one another, wherein the first region comprises at least one first partial reflection surface which is surrounded along a circumference in each case by the at least one second region, and wherein the at least one second EUV-radiation-reflecting region comprises at least one second partial reflection surface which is embodied in a path-connected fashion and which is embodied in a continuous fashion.