Michael Layh
33Patents
5h-index
49Co-inventors
65Inventor score
Filing activity: Aug 5, 2008 → Dec 30, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9013684B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 15 | Active |
| US9599904B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 14 | Active |
| US8705005B2 | Microlithographic illumination system | Physics | 6 | Active |
| US8339577B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 6 | Active |
| US8467031B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 5 | Active |
| US9310694B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 3 | Active |
| US8724086B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 3 | Active |
| US7880969B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
| US8395756B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9658533B2 | Arrangement of a mirror | Physics | 2 | Active |
| US9217930B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9007559B2 | EUV collector with cooling device | Physics | 1 | Active |
| US9239229B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US8891057B2 | Microlithographic projection exposure apparatus | Physics | 1 | Active |
| US10114293B2 | Illumination system and projection objective of a mask inspection apparatus | Physics | 1 | Active |
| US9007563B2 | Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9897925B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US9176390B2 | Method for adjusting an illumination system of a projection exposure apparatus for projection lithography | Physics | 1 | Active |
| US9310692B2 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Physics | 1 | Active |
| US8520307B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US10191382B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 1 | Active |
| US9304400B2 | Illumination system for EUV microlithography | Physics | 0 | Active |
| US10146135B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 0 | Active |
| US10241416B2 | Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US8786849B2 | Method for measuring an optical system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.