In-line inspection and clean for immersion lithography
US9658536B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2014 |
| Grant date | May 23, 2017 |
| Priority date | — |
| Expiry date | Jun 2, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes a lens system, an immersion hood, a wafer stage, an inspection system and a cleaning fluid supplier. The lens system is configured to project a pattern onto a wafer. The immersion hood is configured to confine an immersion fluid between the lens system and the wafer, and includes a peripheral hole configured to suck up the immersion fluid. The wafer stage is configured to position the wafer under the lens system. The inspection system is configured to detect whether there is contamination in the peripheral hole. The cleaning fluid supplier is coupled to the inspection system and configured to supply a cleaning fluid through the peripheral hole to remove the contamination, in which the inspection system and the cleaning fluid supplier are coupled to the wafer stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.