Inspection of substrates using calibration and imaging
US9664625B2 · kind B2 · utility
5Cited by
3References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 27, 2013 |
| Grant date | May 30, 2017 |
| Priority date | — |
| Expiry date | Sep 27, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection system is disclosed. An optical assembly establishes an optical path between a light source and a detector. The optical assembly has a relatively large amount of longitudinal chromatic aberration, so that light at a first wavelength focuses on one region of a substrate in the optical path, while light at a second wavelength simultaneously focuses on another region of the substrate. The system can operate in a calibration mode to determine one or more wavelengths of light corresponding to regions of interest in the substrate and in an imaging mode to image regions of interest in the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.