Rudolph Technologies, Inc.
🏢 View company profile →114Patents
82Active
114Granted
53Portfolio score
Filing activity: Nov 19, 1999 → Mar 22, 2018 · 44 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6256097A | Ellipsometer and ellipsometry method | Physics | 62 | Expired |
| US7729528B2 | Automated wafer defect inspection system and a process of performing such inspection | Electricity | 25 | Active |
| US7634128B2 | Stereoscopic three-dimensional metrology system and method | Electricity | 23 | Active |
| US6519045B2 | Method and apparatus for measuring very thin dielectric film thickness and creating a stable measurement environment | Electricity | 18 | Expired |
| US8139232B2 | Multiple measurement techniques including focused beam scatterometry for characterization of samples | Physics | 17 | Active |
| US6504618B2 | Method and apparatus for decreasing thermal loading and roughness sensitivity in a photoacoustic film thickness measurement system | Physics | 17 | Expired |
| US7197178B2 | Photoresist edge bead removal measurement | Physics | 14 | Expired |
| US7634129B2 | Dual-axis scanning system and method | Physics | 14 | Expired |
| US7369234B2 | Method of performing optical measurement on a sample | Physics | 13 | Expired |
| US7461961B2 | Fiber optic darkfield ring light | Physics | 13 | Active |
| US7616804B2 | Wafer edge inspection and metrology | Physics | 13 | Active |
| US7006221B2 | Metrology system with spectroscopic ellipsometer and photoacoustic measurements | Physics | 12 | Expired |
| US8428393B2 | System and method of non-linear grid fitting and coordinate system mapping | Physics | 12 | Active |
| US7050178B2 | Method and apparatus for increasing signal to noise ratio in a photoacoustic film thickness measurement system | Physics | 12 | Expired |
| US7039228B1 | System and method for three-dimensional surface inspection | Physics | 11 | Expired |
| US8312772B2 | Characterization with picosecond ultrasonics of metal portions of samples potentially subject to erosion | Physics | 9 | Active |
| US7192173B2 | Optical throughput condenser | Physics | 9 | Expired |
| US8699027B2 | Multiple measurement techniques including focused beam scatterometry for characterization of samples | Physics | 8 | Active |
| US6847443B1 | System and method for multi-wavelength, narrow-bandwidth detection of surface defects | Physics | 8 | Expired |
| US7593565B2 | All surface data for use in substrate inspection | Electricity | 8 | Active |
| US7586607B2 | Polarization imaging | Physics | 8 | Active |
| US8426223B2 | Wafer edge inspection | Physics | 7 | Active |
| US8492178B2 | Method of monitoring fabrication processing including edge bead removal processing | Physics | 7 | Active |
| US7196300B2 | Dynamic focusing method and apparatus | Physics | 7 | Expired |
| US7366344B2 | Edge normal process | Physics | 6 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.