Environmental-surrounding-aware OPC
US9679100B2 · kind B2 · utility
19Cited by
27References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2015 |
| Grant date | Jun 13, 2017 |
| Priority date | — |
| Expiry date | Aug 21, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/72
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides a method of performing optical proximity correction (OPC). An integrated circuit (IC) design layout is received. The design layout contains a plurality of IC layout patterns. Two or more of the plurality of IC layout patterns are grouped together. The grouped IC layout patterns are dissected, or target points are set for the grouped IC layout patterns. Thereafter, an OPC process is performed based on the grouped IC layout patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.