Directed self-assembling composition for pattern formation, and pattern-forming method
US9684235B2 · kind B2 · utility
2Cited by
2References
16Claims
0Family size
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Key dates
| Filing date | May 8, 2014 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | May 8, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.