Exposure apparatus
US9684245B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2015 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Jun 15, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3177
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed between the electronic optical system 108 and the wafer stage WS. A substrate 71 constitutes the fog preventing mechanism 70, and opening holes 71a0 that penetrate up to the upper surface of the substrate 71 are formed in a first area of the bottom surface of the substrate 71, and opening holes 71a0 that are closed in the substrate 71 are formed in a second area of the bottom surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.