Micro-electro-mechanical device having two buried cavities and manufacturing process thereof
US9688531B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2016 |
| Grant date | Jun 27, 2017 |
| Priority date | — |
| Expiry date | Jun 23, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0785
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A micro-electro-mechanical device formed in a monolithic body of semiconductor material accommodating a first buried cavity; a sensitive region above the first buried cavity; and a second buried cavity extending in the sensitive region. A decoupling trench extends from a first face of the monolithic body as far as the first buried cavity and laterally surrounds the second buried cavity. The decoupling trench separates the sensitive region from a peripheral portion of the monolithic body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.