Patent · US Active

Calibratable beam shaping system and method

US9690105B2 · kind B2 · utility

1Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 17, 2016
Grant dateJun 27, 2017
Priority date
Expiry dateFeb 17, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B7/003
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping system is connectable to the first and second alignment modules and is operable to sequentially calibrate and align the respective lateral positions of the first and second optical modules with respect to the optical path. The system thereby enables shaping of an incoming light beam of given predetermined wave-front and lateral intensity distribution to form an output light beam having desired wave-front and desired lateral intensity distribution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.