Mask including pellicle, pellicle repairing apparatus, and substrate manufacturing equipment
US9703186B2 · kind B2 · utility
6Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2015 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Sep 15, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.