System and method for reducing dynamic range in images of patterned regions of semiconductor wafers
US9703207B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2012 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Jul 10, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8806
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention includes generating illumination, providing a spatial light modulator (SLM) configured to selectably illuminate one or more portions of a surface of a wafer using the generated illumination, receiving a sets of wafer pattern data indicative of one or more patterns of the wafer, translating the wafer along a direction, selectably controlling a pixel configuration of the SLM to control an illumination pattern on the surface of the wafer, a first pixel configuration illuminating a first set of regions of the wafer at an illumination level, an additional pixel configuration illuminating an additional set of regions at an additional illumination level, wherein a pixel pattern of the SLM based on the received sets of wafer pattern data is configured to move across a surface of the SLM synchronously with the pattern of the translated wafer, and detecting illumination from the surface of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.