Substrate cleaning apparatus and method and brush assembly used therein
US9704729B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2014 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Jul 2, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/34
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Provided are a substrate cleaning apparatus and method and a brush assembly used therein. The substrate cleaning apparatus for contact-cleaning a substrate includes a cleaning brush rotatably disposed in a cylindrical shape and having an outer circumferential surface contacting the substrate to clean the substrate. Here, the cleaning brush includes a plurality of pressure chambers expanding by a fluid pressure and disposed along a longitudinal direction of a rotation axis rotating at a central portion of the cleaning brush, and the plurality of pressure chambers are individually expandable to allow a portion of the outer circumferential surface to protrude in a radial direction and thus contact-clean a portion of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.