Patent · US Active

EUV light source and exposure apparatus

US9706632B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Semiconductor Manufacturing International (Shanghai) Corporation · CN

Inventors

Qiang Wu · 流花街道, CN
Liwan Yue · Shanghai, CN
Emily Shu · Niskayuna, US

Key dates

Filing date	Oct 16, 2015
Grant date	Jul 11, 2017
Priority date	—
Expiry date	Oct 16, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH05G2/002
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position; a laser source configured to generate a first laser beam and a second laser beam and cause the first laser beam and the second laser beam to alternately bombard the rows of droplets to generate EUV light with increased output power; a focusing mirror having at least two first sub-focusing mirrors and at least two second sub-focusing mirrors; and a first driving device having at least two first sub-driving device and at least two second sub-driving device, each of first driving devices driving one of the first sub-focusing mirrors and each of the second sub-driving devices driving one of the second sub-focusing mirrors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.