Determining a configuration for an optical element positioned in a collection aperture during wafer inspection
US9709510B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2015 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Jul 5, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0668
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.