Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
US9709892B2 · kind B2 · utility
1Cited by
10References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2011 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | May 2, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.