Frequency tuning for pulsed radio frequency plasma processing
US9711331B2 · kind B2 · utility
55Cited by
1References
17Claims
0Family size
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Key dates
| Filing date | Jan 10, 2017 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Jan 10, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.