Non-planar radial-flow plasma treatment system
US9711333B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 5, 2015 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Jul 22, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An atmospheric-pressure plasma treatment system includes a plasma source including at least one electrode, a gas in a gas chamber, and an AC power supply that supplies power to the at least one electrode to form a plasma in the gas. A radial-flow surface has a jet nozzle through which the gas flows and the radial-flow surface has a surface profile that conforms to a nonplanar treatment surface of an object. The radial-flow surface is separated from the nonplanar treatment surface by a gap that is less than 2 times a diameter of the jet nozzle so that the gas flows radially outward from the nozzle and between the radial-flow surface and the nonplanar treatment surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.