Kurt D. Sieber
33Patents
6h-index
31Co-inventors
69Inventor score
Filing activity: Oct 17, 1983 → Dec 14, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7041608B2 | Providing fluorocarbon layers on conductive electrodes in making electronic devices such as OLED devices | Electricity | 29 | Expired |
| US5693254A | Cesium-zinc halide phosphors, phosphor screens, and preparation methods | Physics | 17 | Expired |
| US6399159B1 | High-efficiency plasma treatment of polyolefins | Performing Operations; Transporting | 14 | Expired |
| US8567909B2 | Printhead for inkjet printing device | Performing Operations; Transporting | 12 | Active |
| US9711333B2 | Non-planar radial-flow plasma treatment system | Electricity | 9 | Active |
| US5670086A | Vitrified phosphor articles, intermediates, and preparation methods | Chemistry; Metallurgy | 8 | Expired |
| USD311952S | Humidifier | General | 6 | Expired |
| US8840981B2 | Microfluidic device with multilayer coating | Emerging Cross-Sectional Technologies | 5 | Active |
| US4508551A | Steam distributor | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7074549B2 | Photothermographic materials containing phosphors and methods of using same | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8419176B2 | Aqueous compositions with improved silicon corrosion characteristics | Chemistry; Metallurgy | 4 | Active |
| US5391884A | Barium gadolinate phosphor activated by terbium and/or samarium | Physics | 4 | Expired |
| US5742401A | Laser-exposed thermal recording element | Performing Operations; Transporting | 4 | Expired |
| US6603121B2 | High-efficiency plasma treatment of paper | Physics | 4 | Expired |
| US10297741B1 | Electrically-conductive compositions | Electricity | 3 | Active |
| US5132192A | Ordered corundum magnesium tantalum niobium oxide x-ray intensifying screens | Chemistry; Metallurgy | 3 | Expired |
| US10818835B2 | Inertial piezoelectric device | Performing Operations; Transporting | 3 | Active |
| US8029105B2 | Ambient plasma treatment of printer components | Performing Operations; Transporting | 2 | Active |
| US8921236B1 | Patterning for selective area deposition | Electricity | 2 | Active |
| US10763421B2 | Piezoelectric article with dielectric layer and co-planar electrodes | Electricity | 2 | Active |
| US9499908B2 | Atomic layer deposition apparatus | Chemistry; Metallurgy | 1 | Active |
| US8937016B2 | Substrate preparation for selective area deposition | Electricity | 1 | Active |
| US9528184B2 | Atomic-layer deposition method using compound gas jet | Chemistry; Metallurgy | 1 | Active |
| US9506147B2 | Atomic-layer deposition apparatus using compound gas jet | Chemistry; Metallurgy | 1 | Active |
| US7214464B2 | High speed positive-working photothermographic radiographic film | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.