Directed self-assembly composition for pattern formation and pattern-forming method
US9718950B2 · kind B2 · utility
1Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2013 |
| Grant date | Aug 1, 2017 |
| Priority date | — |
| Expiry date | Sep 2, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L33/16
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.