Method of supporting a workpiece during physical vapour deposition
US9719166B2 · kind B2 · utility
1Cited by
3References
4Claims
0Family size
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Key dates
| Filing date | Jun 20, 2012 |
| Grant date | Aug 1, 2017 |
| Priority date | — |
| Expiry date | Jul 14, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods and related apparatus support a work piece during a physical vapor deposition. An aluminium support having a support surface coated with a heat absorbent coating is provided. The support is cooled to around 100° C. and a PVD process is performed such that, with cooling, the work piece temperature is between 350° C. and 450° C. The coating is inert and/or ultra-high voltage compatible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.