Reflective diffraction grating and fabrication method
US9720147B2 · kind B2 · utility
2Cited by
9References
20Claims
0Family size
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Key dates
| Filing date | Mar 28, 2014 |
| Grant date | Aug 1, 2017 |
| Priority date | — |
| Expiry date | Aug 1, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.