Patent · US Active

Protective insulator for HFET devices

US9722063B1 · kind B1 · utility

14Cited by
1References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 11, 2016
Grant dateAug 1, 2017
Priority date
Expiry dateApr 11, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/691
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A high-voltage field effect transistor (HFET) includes a first semiconductor material, a second semiconductor material, and a heterojunction. The heterojunction is disposed between the first semiconductor material and the second semiconductor material. The HFET also includes a plurality of composite passivation layers, where a first composite passivation layer includes a first insulation layer and a first passivation layer, and a second composite passivation layer includes a second insulation layer and a second passivation layer. A gate dielectric is disposed between the first passivation layer and the second semiconductor material. A gate electrode is disposed between the gate dielectric and the first passivation layer. A first gate field plate is disposed between the first passivation layer and the second passivation layer. A source electrode and a drain electrode are coupled to the second semiconductor material, and a source field plate is coupled to the source electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.