Patent · US Active

Brush cleaning method

US9723915B2 · kind B2 · utility

0Cited by

2References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Fu-Ming Huang · Shengang Township, TW
Liang-Guang Chen · Hsinchu, TW
Han-Hsin Kuo · Tainan, TW
Chi-Ming Tsai · New Taipei, TW
He Hui Peng · 埔鹽鄉, TW

Key dates

Filing date	Aug 4, 2015
Grant date	Aug 8, 2017
Priority date	—
Expiry date	Oct 16, 2035

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB08B6/00
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method for cleaning a brush includes inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers. The method further includes rotating the brush in contact with the surface of the first plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.