Photoresist composition
US9726976B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Sep 14, 2010 |
| Grant date | Aug 8, 2017 |
| Priority date | — |
| Expiry date | Jul 14, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1):
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.