Process for producing fluoride gas
US9731968B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Jun 8, 2009 |
| Grant date | Aug 15, 2017 |
| Priority date | — |
| Expiry date | Jan 17, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01G28/007
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed is a process for producing a fluoride gas that can produces fluoride gases such as BF3, SiF4, GeF4, PF5 or AsF5 at a reduced production cost in a simple manner. The process is characterized in that a compound containing an atom, which, together with a fluorine atom, can form a polyatomic ion, is added to a hydrogen fluoride solution to produce the polyatomic ion in a hydrogen fluoride solution and to evolve a fluoride gas comprising the fluorine atom and the atom that, together with the fluorine atom, can form a polyatomic ion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.